Extreme ultraviolet lithography
Extreme ultraviolet lithography is a term used to describe and catalogue material of this kind, established as a heading by Deutsche Nationalbibliothek, Library of Congress. It sits within the wider heading of Lithography. The heading is held on record by Deutsche Nationalbibliothek, Library of Congress. 2 cited statements stand behind this entry, drawn from 3 verified sources, corroborated by 2 independent institutional witnesses.
Also recorded as EUVL (2019 : Monterey, Calif.); International Conference on EUV Lithography (2019 : Monterey, Calif.); Far ultraviolet lithography; EUVL (Extreme ultraviolet lithography); EUV lithography (Extreme ultraviolet lithography); International Conference on EUV Lithography (2023 : Monterey, Calif.); International Conference on EUVL (2023 : Monterey, Calif.).
Overview
What the sources state
• Placed within: Lithography (Library of Congress Subject Headings: Extreme ultraviolet lithography (sh2009000606))
• Classification: Established heading in Library of Congress Subject Headings (Library of Congress Subject Headings: Extreme ultraviolet lithography (sh2009000606))
Sources
Each source is named with the standing the house places on it, so the evidence can be weighed rather than taken on trust.
Library record · Institutional or primary · Deutsche Nationalbibliothek
Deutsche Nationalbibliothek, Integrated Authority File record 1199949574: International Conference on Extreme Ultraviolet Lithography (2019 : Monterey, Calif.)
Consult the sourceLibrary record · Institutional or primary · Deutsche Nationalbibliothek
Deutsche Nationalbibliothek, Integrated Authority File record 1312185481: International Conference on Extreme Ultraviolet Lithography (2023 : Monterey, Calif.)
Consult the sourceLibrary record · Institutional or primary · Library of Congress
Library of Congress Subject Headings: Extreme ultraviolet lithography (sh2009000606)
Consult the source